Study on the device characteristics of FePc and FePcCl organic thin film Schottky diodes: Influence of oxygen and post deposition annealing

Journal of Non-Crystalline Solids

Volumn 353, Issue 4, 2007, Pages 398-404

  Rajesh, K R ^a   Menon, C S ^a  

^a MAHATMA GANDHI UNIVERSITY   (India)

Author keywords

Conductivity; Devices; Polymers and organics; Surfaces and interfaces; Vapor phase deposition

Indexed keywords

ANNEALING; CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; IRON COMPOUNDS; SCHOTTKY BARRIER DIODES;

ELECTRICAL PARAMETERS; ELECTRODE-LIMITED SCHOTTKY EMISSION; OHMIC CONDUCTION; SPACE CHARGE LIMITED CONDUCTIVITY (SCLC);

THIN FILMS;

EID: 33846931796     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2006.12.016     Document Type: Article

References (22)

1. Gould R.D. Coord. Chem. Rev. 156 (1996) 237
2. Collins R.A., and Mohammed K.A. J. Phys. D 21 (1998) 154
3. Abdel-Malik T.G. Thin Solid Films 205 (1991) 241
4. Abdel-Malik T.G., Ahmed A.A., and Riad A.S. Phys. Status Solidi (a) 121 (1990) 507
5. Gravano S., Hassan A.K., and Gould R.D. Int. J. Electron. 70 (1991) 477
6. Martin M., André J.J., and Simon J. Nouv. J. Chim. 5 (1981) 485
7. Maissel L.I., and Glang R. Hand Book of Thin Film Technology (1983), Mc Graw-Hill, New York
8. Sze S.M. Physics of Semiconductor Devices (1981), Eastern Wiley, New Delhi
9. Sadaoka Y., Jones T.A., and Gopel W. J. Mater. Sci. Lett. 8 (1989) 1095
10. Hassan A.K., and Gould R.D. Int. J. Electron. 74 (1993) 59
11. Rhoderick E.H., and Williams R.H. Metal-Semiconductor Contacts. 2nd Ed. (1988), Clarendon, Oxford
12. Ghosh A.K., and Feng T. J. Appl. Phys. 44 (1973) 2781
13. Riad A.S., Khalil S.M., and Darwish S. Thin Solid Films 249 (1994) 219
14. Wilson W., and Collins R.A. Sens. Actuat. 12 (1978) 389
15. Sharma G.D. Synth. Metals 74 (1995) 227
16. Michel M., André J.J., and Simon J. J. Appl. Phys. 54 5 (1983) 2792
17. Ahamed A., and Collins R.A. Phys. Status Solidi (a) 123 (1991) 201
18. Gould R.D. Thin Solid Films 125 (1985) 63
19. Gould R.D. J. Phys. D: Appl. Phys. 9 (1986) 1785
20. Twarowski A.J. J. Chem. Phys. 77 (1982) 5840
21. Simmons J.G. J. Phys. D. 38 (1971) 2378
22. Fan F.R., and Faulkner L.R. J. Chem. Phys. 69 (1978) 3334