Effect of photoresist grating thickness and pattern open width on performance of periodically poled LiNbO3 for a quasi-phase matching device

Optical Materials

Volumn 29, Issue 8, 2007, Pages 923-926

  Kwon, S W ^a   Song, Y S ^a   Yang, W S ^b   Lee, H M ^b   Kim, W K ^b   Lee, H Y ^b   Lee, D Y ^c  

^a Hankuk Aviation University   (South Korea)

^b Korea Electronic Technology Institute (KETI)   (South Korea)

^c Daelim University   (South Korea)

Author keywords

Duty cycle; Mid infrared; Pattern open width; Periodically poled lithium niobate; Photoresist grating

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRIC FIELD EFFECTS; INFRARED RADIATION; LITHIUM COMPOUNDS; PHOTORESISTS;

DUTY CYCLE; PATTERN OPEN WIDTH; PERIODICALLY POLED LITHIUM NIOBATE; PHOTORESIST GRATINGS (PR);

FIBER BRAGG GRATINGS;

EID: 33846871904     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2006.02.008     Document Type: Article

References (7)

1. Nakamura M., Kotoh M., Taniguchi H., and Tadatomo K. Jpn. J. Appl. Phys. 38 (1999) L512
2. Hatanaka T., Nakamura K., Taniuchi T., Ito H., Furukawa Y., and Kitamura K. Appl. Phys. Lett. 25 (2000) 651
3. Cho Y., Kazuta S., and Ito H. Appl. Phys. Lett. 79 (2001) 2955
4. Myers L.E., and Bosenberg W.R. IEEE J. Quantum Electron. 33 (1997) 1663
5. Kong Y., Xu J., Li B., Chen S., Huang Z., Zhang L., Liu S., Yan W., Liu H., Xie X., Shi L., Li X., and Zhang G. Opt. Mater. 27 (2004) 471
6. Vincent B., Boudrioua A., Kremer R., and Moretti P. Opt. Commun. 247 (2005) 461
7. Gopalan V., Jia Q.X., and Mitchell T.E. Appl. Phys. Lett. 75 (1999) 2482