Laser direct-write processing

MRS Bulletin

Volumn 32, Issue 1, 2007, Pages 9-11

  Arnold, Craig B ^a,b   Piqué, Alberto ^c  

^a Princeton University   (United States)

^b PRINCETON UNIVERSITY   (United States)

^c NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LARGE SCALE SYSTEMS; LASER APPLICATIONS; LASER PULSES; NOZZLES;

MATERIAL SYSTEMS; PATTERN FORMATION; WRITE PROCESSING; WRITE TOOLS;

TECHNICAL WRITING;

EID: 33846809263     PISSN: 08837694     EISSN: None     Source Type: Journal    
DOI: 10.1557/mrs2007.9     Document Type: Article

References (32)

1. See for instance, D.B. Chrisey, Science 289 (2000) p. 879;
2. A. Piqué and D.B. Chrisey, eds., Direct-Write Technologies for Rapid Prototyping Applications (Academic Press, San Diego, 2002).
3. C.C. Kai, L.K. Fai, and L.C. Sing, Rapid Prototyping: Principles and Applications (World Scientific, London, 2004).
4. P.K. Venuvinod and W. Ma, Rapid Prototyping: Laser Based and Other Technologies (Kluwer Academic, Norwell, MA, 2003).
5. A. Piqué and D.B. Chrisey, eds., Direct-Write Technologies for Rapid Prototyping Applications (Academic Press, San Diego, 2002).
6. K.W. Gregory and R.R. Anderson, IEEE J. Quant. Elect. 26 (1990) p. 2289.
7. P. Couty, F. Wagner, and P. Hoffmann, Opt. Eng. 44 068001 (2005).
8. D. Bäuerle, Laser Processing and Chemistry, 3rd Ed. (Springer, Berlin, 2000).
9. W.M. Steen and K. Watkins, Laser Materials Processing, 3rd Ed. (Springer, Berlin, 2003).
10. H. Endert, R. Patzel, and D. Basting, Opt. Quant. Elect. 27 (1995) p. 1319.
11. M.C. Gower, Opt. Exp. 7 (2000) p. 56.
12. A. Kureil and N.B. Dahotre, J. Biomed. Appl. 5 (2005) p. 5.
13. X. Ding, Y. Kawaguchi, H. Niino, and A. Yabe, Appl. Phys. A 75 (2002) p. 641.
14. G. Kopitkovas, T. Lippert, C. David, A. Wokaun, and J. Gobrecht, Microelectron. Eng. 67 (2003) p. 438.
15. V. Tornari, V. Zafiropulos, A. Bonarou, N.A. Vainos, and C. Fotakis, Opt. Lasers Eng. 34 (2000) p. 309.
16. P.P. Pronko, S.K. Dutta, J. Squier, J.V. Rudd, D. Du, and G. Mourou, Opt. Commun. 114 (1995) p. 106.
17. M. Lenzner, J. Kruger, W. Kautek, and F. Krausz, Appl. Phys. A 68 (1999) p. 369.
18. J. Feinleib, J. deNeufville, S.C. Moss, and S.R. Ovshinsky, Appl. Phys. Lett. 18 (1971) p. 254.
19. R. Vilar, J. Laser App. 11 (1999) p. 64.
20. D.L. Bourell, H.L. Marcus, J.W. Barlow, and J.J. Beaman, Int. J. Powder Metall. 28 (1992) p. 369.
21. T.R. Dietrich, W. Ehrfeld, M. Lacher, M. Kramer, and B. Speit, Microelectron. Eng. 30 (1996) p. 497.
22. K. Itoh, W. Watanabe, S. Nolte, and C.B. Schaffer, MRS Bull. 31 (8) (2006) p. 620.
23. E.N. Glezer, M. Milosavljevic, L. Huang, R.J. Finlay, T.H. Her, J.P. Callan, and E. Mazur, Opt. Lett. 21 (1996) p. 2023.
24. P.R. Herman, R.S. Marjoribanks, A. Oettl, K. Chen, I. Konovalov, and S. Ness, Appl. Surf. Sci. 154 (2000) p. 577.
25. A. Zoubir, M. Richardson, C. Rivero, A. Schulte, C. Lopez, K. Richardson, N. Ho, and R. Vallee, Opt. Lett. 29 (2004) p. 748.
26. Y. Cheng, K. Sugioka, and K. Midorikawa, Opt. Lett. 29 (2004) p. 2007.
27. J. Bohandy, B.F. Kim, and F.J. Adrian, J. Appl. Phys. 60 (1986) p. 1538.
28. D.B. Chrisey, A. Piqué, J. Fitz-Gerald, R.C.Y. Auyeung, R.A. McGill, H.D. Wu, and M. Duignan, Appl. Surf. Sci. 154 (2000) p. 593.
29. A. Pique, R.C.Y. Auyeung, J.L. Stepnowski, D.W. Weir, C.B. Arnold, R.A. McGill, and D.B. Chrisey, Surf. Coat. Technol. 163 (2003) p. 293.
30. M.J. Renn and R. Pastel, J. Vac. Sci. Tech. B 16 (1998) p. 3859.
31. S.D. Allen, J. Appl. Phys. 52 (1981) p. 6501.
32. J. Serbin, A. Egbert, A. Ovsianikov, B.N. Chichkov, R. Houbertz, G. Domann, J. Schulz, C. Cronauer, L. Frohlich, and M. Popall, Opt. Lett. 28 (2003) p. 301.