Effect of electrostatic interaction on deposition of colloid on partially covered surfaces. Part I. Model formulation

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 294, Issue 1-3, 2007, Pages 254-266

  Weroński, Paweł ^a,b  

^a INSTITUTE OF CATALYSIS AND SURFACE CHEMISTRY   (Poland)

^b CENTER FOR NONLINEAR STUDIES   (United States)

Author keywords

Adsorption of colloid particles; Colloid deposition; Monte Carlo simulation; Particle electrostatic interaction; Random sequential adsorption; RSA model

Indexed keywords

ADSORPTION; DEPOSITION; ELECTROLYTES; ELECTROSTATICS; INTERFACES (MATERIALS); MATHEMATICAL MODELS; MONTE CARLO METHODS;

COLLOID DEPOSITION; CURVILINEAR TRAJECTORY; PARTICLE ELECTROSTATIC INTERACTION; RANDOM SEQUENTIAL ADSORPTION (RSA);

COLLOIDS;

ELECTROLYTE;

ARTICLE; COLLOID; ELECTRICITY; MODEL; PARTICULATE MATTER; PRIORITY JOURNAL; RANDOM SEQUENTIAL ADSORPTION; SURFACE PROPERTY;

EID: 33846609717     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2006.08.018     Document Type: Article

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