Application of DoseMapper for 65nm gate CD control: Strategies and results

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 II, Issue , 2006, Pages

  Jeewakhan, Nazneen ^a   Shamma, Nader ^a   Choi, Sang Jun ^a   Alvarez, Roque ^a   Son, D H ^b   Nakamura, Makoto ^b   Pici, Vinny ^b   Schreiber, Jim ^b   Tzeng, Wei Shun ^b   Ang, Sean ^b   Park, Daniel ^b  

^a CYPRESS SEMICONDUCTOR   (United States)

^b ASML US Inc   (United States)

Author keywords

193nm lithography; 65nm technology; DoseMapper; Mask CD control; MEEF; Wafer CD control

Indexed keywords

DOSEMAPPERS; MASK CD CONTROL; MEEF; WAFER CD CONTROL;

ACTUATORS; ERROR COMPENSATION; MASKS; PARAMETER ESTIMATION; PHOTOLITHOGRAPHY;

INTEGRATED CIRCUITS;

EID: 33846607351     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.692938     Document Type: Conference Paper

References (0)