Fast non-destructive optical measurements of critical dimension uniformity and linearity on AEI and ASI phase-shift masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 II, Issue , 2006, Pages

  Gray, Alexander ^a   Lam, John C ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b N and K Technology Inc   (United States)

Author keywords

Broadband reflectometry; CD linearity; Critical dimensions; Forouhi bloomer dispersion equations; Optical metrology; RCWA

Indexed keywords

BROADBAND REFLECTOMETRY; CRITICAL DIMENSIONS; FOROUHI-BLOOMER DISPERSION EQUATIONS; OPTICAL METROLOGY; RIGOROUS COUPLED WAVE ANALYSIS (RCWA);

LIGHT TRANSMISSION; NONDESTRUCTIVE EXAMINATION; OPTICAL DEVICES; OPTICAL VARIABLES MEASUREMENT; PHASE SHIFT; PROFILOMETRY; REFLECTOMETERS; SCANNING ELECTRON MICROSCOPY;

MASKS;

EID: 33846580129     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.686150     Document Type: Conference Paper

References (0)