Large scale ab initio molecular dynamics simulations of hydrogen-induced degradation of Ta diffusion barriers in ultralow-k dielectric systems

Applied Physics Letters

Volumn 90, Issue 3, 2007, Pages

  Dai, Ling ^a   Tan, V B C ^a   Yang, Shuo Wang ^b   Wu, Ping ^b   Chen, Xian Tong ^c  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF HIGH PERFORMANCE COMPUTING   (Singapore)

^c INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DEGRADATION; DIELECTRIC DEVICES; DIFFUSION; HYDROGEN; MOLECULAR DYNAMICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON CARBIDE;

BARRIER EFFECTS; DIFFUSION BARRIER LAYERS;

TANTALUM;

EID: 33846403698     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2432948     Document Type: Article

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