메뉴 건너뛰기




Volumn 2005, Issue , 2005, Pages 597-600

First-principles modeling of double-gate UTSOI MOSFETs

Author keywords

[No Author keywords available]

Indexed keywords

GATE DIELECTRICS; INTERFACES (MATERIALS); QUANTUM THEORY; SURFACE ROUGHNESS; WAVE FUNCTIONS;

EID: 33846367498     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (10)

References (11)
  • 1
    • 0037566742 scopus 로고    scopus 로고
    • Frontiers of silicon-on-insulator
    • G. K. Celler and S. Cristoloveanu, "Frontiers of silicon-on-insulator," J. Appl. Phys., vol. 93, pg. 4955, 2003.
    • (2003) J. Appl. Phys , vol.93 , pp. 4955
    • Celler, G.K.1    Cristoloveanu, S.2
  • 3
    • 0000776042 scopus 로고
    • Macroscopic physics of the silicon inversion layer
    • M. G. Ancona and H. F. Tiersten, "Macroscopic physics of the silicon inversion layer," Phys. Rev. B, vol. 35, pg. 7959, 1987.
    • (1987) Phys. Rev. B , vol.35 , pp. 7959
    • Ancona, M.G.1    Tiersten, H.F.2
  • 4
    • 10644250257 scopus 로고
    • Inhomogeneous electron gas
    • P. Hohenberg and W. Kohn, "Inhomogeneous electron gas," Phys. Rev., vol. 136, pg. 8864, 1964.
    • (1964) Phys. Rev , vol.136 , pp. 8864
    • Hohenberg, P.1    Kohn, W.2
  • 5
    • 27144533593 scopus 로고    scopus 로고
    • First-principles mobility calculations and atomic-scale interface roughness in nanoscale structures
    • M. H. Evans, X.-G. Zhang, J. D. Joannopoulos, and S. T. Pantelides, "First-principles mobility calculations and atomic-scale interface roughness in nanoscale structures," Phys. Rev. Lett., vol. 95, pg. 106802, 2005.
    • (2005) Phys. Rev. Lett , vol.95 , pp. 106802
    • Evans, M.H.1    Zhang, X.-G.2    Joannopoulos, J.D.3    Pantelides, S.T.4
  • 6
    • 0023421993 scopus 로고
    • Double-gate silicon-on-insulator transistor with volume inversion: A new device with greatly enhanced performance
    • F. Balestra, S. Cristoloveanu, M. Benachir, and J. Brini, "Double-gate silicon-on-insulator transistor with volume inversion: a new device with greatly enhanced performance," IEEE Electron Dev. Lett., vol. 8, pg. 410, 1987.
    • (1987) IEEE Electron Dev. Lett , vol.8 , pp. 410
    • Balestra, F.1    Cristoloveanu, S.2    Benachir, M.3    Brini, J.4
  • 7
  • 9
    • 0037115552 scopus 로고    scopus 로고
    • On the enhanced electron mobility in strained-silicon inversion layers
    • M. V. Fischetti, F. Gámiz, and W. Hänsch, "On the enhanced electron mobility in strained-silicon inversion layers," J. Appl. Phys., vol. 92, pg. 7320, 2002.
    • (2002) J. Appl. Phys , vol.92 , pp. 7320
    • Fischetti, M.V.1    Gámiz, F.2    Hänsch, W.3
  • 10
    • 4043069747 scopus 로고    scopus 로고
    • 2 dielectrics
    • 2 dielectrics," Appl. Phys. Lett., vol. 85, pg. 672, 2004.
    • (2004) Appl. Phys. Lett , vol.85 , pp. 672
    • Baik, H.S.1
  • 11
    • 1642272204 scopus 로고    scopus 로고
    • On the modeling of surface roughness limited mobility in SOI MOSFETs and its correlation to the transistor effective field
    • D. Esseni, "On the modeling of surface roughness limited mobility in SOI MOSFETs and its correlation to the transistor effective field," IEEE Trans. Electron Dev., vol. 51, pg. 394, 2004.
    • (2004) IEEE Trans. Electron Dev , vol.51 , pp. 394
    • Esseni, D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.