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Volumn 3, Issue 1, 2007, Pages 132-138

Bond-detach lithography: A method for micro/nanolithography by precision PDMS patterning

(4) Thangawng, Abel L a Swartz, Melody A a Glucksberg, Matthew R a Ruoff, Rodney S a

a Northwestern University (United States)

Author keywords

Lithography; Microfabrication; Patterning; Reactive ion etching

Indexed keywords

BIOFILMS; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; REACTIVE ION ETCHING;

BOND-DETACH LITHOGRAPHY; MICROFABRICATION; NANOSCALE PATTERNS;

PATTERN MATCHING;

DIMETICONE; NANOMATERIAL; NYLON; POLY(DIMETHYLSILOXANE) POLYAMIDE COPOLYMER; POLY(DIMETHYLSILOXANE)-POLYAMIDE COPOLYMER; UNCLASSIFIED DRUG;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; GAS; HEAT; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

CHEMISTRY; CRYSTALLIZATION; DIMETHYLPOLYSILOXANES; GASES; HEAT; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MICROCHEMISTRY; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; NYLONS; PARTICLE SIZE; SURFACE PROPERTIES;

EID: 33846297733 PISSN: 16136810 EISSN: 16136829 Source Type: Journal
DOI: 10.1002/smll.200500418 Document Type: Article

Times cited : (49)

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