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Volumn 49, Issue 12, 2006, Pages 28-30
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Addressing 32nm half-pitch challenges with double-patterning lithography
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Author keywords
[No Author keywords available]
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Indexed keywords
DOMINANT PATTERNING TECHNOLOGY;
DOUBLE PATTERNING LITHOGRAPHY;
IMMERSION LITHOGRAPHY;
SEMICONDUCTOR MANUFACTURERS;
NANOTECHNOLOGY;
SEMICONDUCTOR DEVICE MANUFACTURE;
SEMICONDUCTOR DEVICES;
LITHOGRAPHY;
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EID: 33846278667
PISSN: 0038111X
EISSN: None
Source Type: Trade Journal
DOI: None Document Type: Article |
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Times cited : (1)
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References (0)
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