The photorefractive sensitivity and the effective electron transport length in two-centre holographic recording

Chinese Physics

Volumn 15, Issue 12, 2006, Pages 2977-2983

  Zhou, Yu ^a   Liu, Li Ren ^a   Liu, De An ^a   Luan, Zhu ^a   Yan, Ai Min ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

Electron transport length; Photorefractive; Sensitivity; Two centre holographic recording

Indexed keywords

ELECTRON TRANSPORT PROPERTIES; ELECTRON TRAPS; NONLINEAR EQUATIONS; PHOTOREACTIVITY; SINGLE CRYSTALS;

ELECTRON TRANSPORT LENGTHS; KUKHTAREV EQUATIONS; PHOTOREFRACTIVE SENSITIVITY; TWO-CENTRE HOLOGRAPHIC RECORDING;

HOLOGRAPHY;

EID: 33846086443     PISSN: 10091963     EISSN: 17414199     Source Type: Journal    
DOI: 10.1088/1009-1963/15/12/035     Document Type: Article

References (15)

1. Buse K, Adibi A and Psaltis D 1998 Nature 393 665
2. Liu L, Liu B, Yan X, Shao L, Li G, Yin Y, Li J and Guo Y 1999 J. Opt. A: Pure Appl. Opt. 1 220
3. Adibi A, Buse K and Psaltis D 2001 J. Opt. Soc. Am. B 18 584
4. Adibi A, Buse K and Psaltis D 2000 Opt. Lett. 25 539
5. Yung L, Moharam M G, EI Guibaly F and Lun E 1979 J. Appl. Phys. 50 4201
6. Moharam M G, Gaylord T K and Magnusson R 1979 J. Appl. Phys. 50 5462
7. Gunter P and Huignard J P 1988 Photorefractive Materials and Their Applications I (New York: Springer) p47
8. Momtahan O and Adibi A 2003 J. Opt. Soc. Am. B 20 449
9. Kogelnik H 1969 Bell Syst. Tech. J. 48 2909
10. Zhou Y, Liu L, Luan Z, Wang L and Dai C X 2004 SPIE 5560 363
11. Glass A M, von der Linde D and Negran T J 1974 Appl. Phys. Lett. 25 233
12. Solymar L, Webb D J and Grunnet-Jepsen A 1996 The physics and applications of photorefractive materials (New York: Clarendon) p41
13. Cudney R S, Pierce R M, Bacher G D, Mahgerefteh D and Feinberg J 1992 J. Opt. Soc. Am. B 9 1704
14. Adibi A, Buse K and Psaltis D 2001 Appl. Phys. B 72 653
15. Dai C X, Liu L R, Liu D A, Zhou Y, Chai Z F and Luan Z 2005 Chin. Phys. 14 2491