Direct imaging of spin-reorientation transitions in ultrathin Ni films by spin-polarized low-energy electron microscopy

Surface and Interface Analysis

Volumn 38, Issue 12-13, 2006, Pages 1550-1553

  Klein, C ^a   Ramchal, R ^b,c   Farle, M ^b   Schmid, A K ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF DUISBURG ESSEN   (Germany)

^c UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

Spin reorientation transition; SPLEEM; Ultrathin films

Indexed keywords

ELECTRON BEAMS; ELECTRON MICROSCOPY; IMAGE ANALYSIS; MAGNETIZATION; NICKEL; NUCLEATION;

MAGNETIC CONTRAST; ORTHOGONAL POLARIZATIONS; SPIN REORIENTATION TRANSITION; SPIN-POLARIZED LOW-ENERGY ELECTRON MICROSCOPY (SPLEEM);

ULTRATHIN FILMS;

EID: 33845963483     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2418     Document Type: Conference Paper

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