Photoemission electron microscopy with chemical sensitivity: SPELEEM methods and applications

Surface and Interface Analysis

Volumn 38, Issue 12-13, 2006, Pages 1554-1557

  Locatelli, A ^a   Aballe, L ^a   Mentes, T O ^a   Kiskinova, M ^a   Bauer, E ^b  

^a SINCROTRONE TRIESTE   (Italy)

^b ARIZONA STATE UNIVERSITY   (United States)

Author keywords

LEEM; PEEM; Spectromicroscopy

Indexed keywords

ELECTRON DIFFRACTION; MAGNETISM; NANOSTRUCTURED MATERIALS; PHOTOEMISSION; SPECTROSCOPIC ANALYSIS; SYNCHROTRON RADIATION;

CHEMICAL SENSITIVITY; ENERGY RESOLUTION; NANOSPECTROSCOPY BEAMLINE; SPELEEM; SURFACE SCIENCE; XPEEM;

ELECTRON MICROSCOPY;

EID: 33845956358     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2424     Document Type: Conference Paper

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