Shave-off depth profiling of transparent conductive films and data analysis of the profile

Surface and Interface Analysis

Volumn 38, Issue 12-13, 2006, Pages 1734-1737

  Nakamura, K ^a   Ishikawa, Y ^a   Utsumi, K ^a   Iigusa, H ^a   Tanaka, R ^b,c   Ishizaki, Y ^b,c   Yamamoto, T ^b,c   Maekawa, A ^b,c   Owari, M ^c   Nojima, M ^b   Nihei, Y ^b  

^a TOSOH CORPORATION   (Japan)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

^c INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

Author keywords

Aluminum doped zinc oxide; Shave off depth profiling; SIMS; Transparent conductive film

Indexed keywords

ALUMINUM; DATA REDUCTION; ELECTRIC CONDUCTIVITY; FLAT PANEL DISPLAYS; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR DOPING; SENSITIVITY ANALYSIS; SURFACE ROUGHNESS; THIN FILMS; ZINC OXIDE;

ALUMINUM DOPED ZINC OXIDE (ZAO); SHAVE-OFF DEPTH PROFILING; TRANSPARENT CONDUCTIVE FILMS;

CONDUCTIVE FILMS;

EID: 33845931930     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2436     Document Type: Conference Paper

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