Synthesis and characterization of photosensitive polysiloxane

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 254, Issue 1, 2007, Pages 125-130

  Sun, F ^a   Jiang, S L ^a  

^a BEIJING UNIVERSITY OF CHEMICAL TECHNOLOGY   (China)

Author keywords

Acrylate; Polydimethylsiloxane epoxy acrylate; Polysiloxane; Synthesis; UV curing

Indexed keywords

CURING; GELS; PARAFFINS; PHOTOSENSITIVITY; REACTION KINETICS; SYNTHESIS (CHEMICAL);

DECOMPOSITION TEMPERATURE; POLYDIMETHYLSILOXANE EPOXY ACRYLATES; POLYSILOXANE; UV CURING;

POLYSILANES;

EID: 33845659502     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.10.067     Document Type: Article

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