Effect of annealing on magnetic properties and silicide formation at Co/Si interface

Bulletin of Materials Science

Volumn 29, Issue 6, 2006, Pages 647-651

  Agarwal, Shivani ^a   Ganesan, V ^b   Tyagi, A K ^c   Jain, I P ^a  

^a UNIVERSITY OF RAJASTHAN   (India)

^b University Campus   (India)

^c INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

Author keywords

AFM; Interfaces; Metal suicide MOKE; SIMS; Solid state mixing

Indexed keywords

COBALT SILICIDE; METAL SUICIDE MOKE; SECONDARY ION MASS SPECTROSCOPY (SIMS); SOLID STATE MIXING;

ATOMIC FORCE MICROSCOPY; ELECTRON BEAMS; INTERFACES (MATERIALS); MAGNETIC PROPERTIES; MASS SPECTROMETRY; SILICON COMPOUNDS; SURFACE ROUGHNESS; THIN FILMS;

ANNEALING;

EID: 33845597036     PISSN: 02504707     EISSN: None     Source Type: Journal    
DOI: 10.1007/s12034-006-0018-x     Document Type: Conference Paper

References (11)

1. Aboclfotob M O, Marwick A D and Frccouf J L 1994 Phys. Rev. B49 10753
2. Bulle-Lieuwma C W T 1993 Appl. Surf. Sci. 68 1
3. D'Heurle F M and Petersson C S 1985 Thin Solid Films 128 283
4. Lau S S, Mayer J W and Tu K N 1978 J. Appl. Phys. 49 4005
5. Lim B S, Ma E, Nicolet M-A and Natan M 1987 J. Appl. Phys. 61 5027
6. Liu P et al 1993 J. Appl. Phys. 74 1700
7. Murarka S P 1980 J. Vac. Sci. Technol. 17 775
8. Tsay J S, Yang C S, Yao Y D, Liou Y and Lee S F 1998 J. Appl. Phys. 37 5976
9. Vantomme A, Nicolet M-A and Theodore N David 1994 J. Appl. Phys. 75 3882
10. Van Gurp G J, Vander Weg W F and Sigurd D 1978 J. Appl. Phys. 494011
11. Wu Y E, Tsay J S, Chen S C, Fu T Y and Shern C S 2001 Jpn J. Appl Phys. 40 6825