In-situ optical coatings on subsurface-damage removed substrate

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2714, Issue , 1996, Pages 340-350

  Yoshida, Kunio ^a   Hirao, T ^a   Kamimura, Tomosumi ^a   Ochi, Kanyoshi ^a   Kaku, Schukichi ^a   Yoshida, Hidetsugu ^b   Fujita, Hisanori ^b   Tani, F ^c   Sunagawa, M ^c   Okamoto, Yoshiaki ^d  

^a OSAKA INSTITUTE OF TECHNOLOGY   (Japan)

^b OSAKA UNIVERSITY   (Japan)

^c Shinmaywa Industry Co Ltd   (Japan)

^d Okamoto Optics Works Co Ltd   (Japan)

Author keywords

Damage resistant optical coatings; Ion beam etching; Laser induced damage; Subsurface damage

Indexed keywords

ABSORPTION; ETCHING; FUSED SILICA; HIGH POWER LASERS; ION BEAMS; IONS; LASER DAMAGE; LASERS; OPTICAL COATINGS; OPTICAL MATERIALS; PULSED LASER APPLICATIONS; SILICA; SUBSTRATES;

AB SORPTION COEFFICIENTS; DAMAGE THRESHOLDS; DAMAGE-RESISTANT OPTICAL COATINGS; DEPOSITION CONDITIONS; FUSED SILICA GLASSES; HIGH POWERS; IN-SITU; ION BEAM ETCHINGS; MULTILAYER DIELECTRIC COATINGS; OPTICAL SUBSTRATES; OPTICAL-; PULSED LASERS; SHORT WAVELENGTHS; SUBSURFACE-DAMAGE;

COATINGS;

EID: 33845563518     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240412     Document Type: Conference Paper

References (1)

1. K.Yoshida, K.Ochi, H.Yoshida, M.Ohtani, M.Sawamura, "Damage threshold of antireflection coating on subsurface-damage removed fused silica glass" , in CLEO '93 ,Vol. 11, pp.174-175 (Baltimore, Maryland) 1993.