Characterization of Ag nanoparticles on Si wafer prepared using Tollen's reagent and acid-etching

Applied Surface Science

Volumn 253, Issue 2, 2006, Pages 959-965

  Lim, Dong Chan ^a   Lopez Salido, Ignacio ^a   Kim, Young Dok ^a,b  

^a UNIVERSITY OF KONSTANZ   (Germany)

^b Ewha Womans University   (South Korea)

Author keywords

Ag; Nanoparticle; Oxidation; XPS

Indexed keywords

ETCHING; OXIDATION; PARTICLE SIZE ANALYSIS; SILICON WAFERS; SILVER COMPOUNDS; SYNTHESIS (CHEMICAL); X RAY PHOTOELECTRON SPECTROSCOPY;

AG NANOPARTICLES; CHEMICAL ETCHING; REVERSIBLE OXIDATION; TOLLEN'S REAGENT;

NANOSTRUCTURED MATERIALS;

EID: 33845444742     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.01.040     Document Type: Article

References (31)

1. Valden M., Lai X., and Goodman D.W. Science 281 (1998) 1647
2. Haruta M., Tsubota S., Kobayashi T., Kageyama H., Genet M.J., and Delmon B. J. Catal. 144 (1993) 175
3. De Oliveira L.A., Wolf A., and Schüth F. Catal. Lett. 73 (2001) 157
4. Meyer R., Lemire C., Shaikhutdinov Sh.K., and Freund H.-J. Gold Bull. 37 (2004) 72
5. Schauermann S., Hoffmann J., Johanék V., Hartmann J., Libuda J., and Freund H.-J. Angew. Chem. Int. Ed. 41 (2002) 2643
6. Garamus V.M., Maksimova T., Richtering W., Aymonier C., Thomann R., Antonietti L., and Mecking S. Macromolecules 37 (2004) 7893
7. Breslow R. Organic Reaction Mechanism. second ed. (1969), W.A. Benjamin Inc., NY
8. http://engineering.dartmouth.edu/other/microeng/processing/etching/metal.ech.html
9. Luo K., Clair T.P.St., Lai X., and Goodman D.W. J. Phys. Chem. B 104 (2000) 3050
10. Vijayakrishman V., Chainani A., Sarma D.D., and Rao C.N.R. J. Phys. Chem. 96 (1992) 8679
11. Bukhtiyarov V.I., Carley A.F., Dollard L.A., and Roberts M.W. Surf. Sci. 381 (1997) L605
12. Rodriguez R.A., Kuhn M., and Hrbek J. J. Phys. Chem. 100 (1996) 18240
13. Lim D.C., Lopez-Salido I., and Kim Y.D. Surf. Sci. 583 (2005) 6
14. Wertheim G.K., DiCenzo S.B., and Buchanan D.N.E. Phys. Rev. B 33 (1986) 5384
15. Radnik J., Mohr C., and Claus P. Phys. Chem. Chem. Phys. 5 (2003) 172
16. Zhang P., and Sham T.K. Phys. Rev. Lett. 90 (2003) 245502
17. Luo K., Kim D.Y., and Goodman D.W. J. Mol. Catal. A 167 (2001) 191
18. Goodman D.W. In: Schwarz J.A., Conlescu C.I., and Putyera K. (Eds). Encyclopedia of Nanoscience and Nanotechnology (2004), Marcel Dekker Inc., NY 611-620
19. Steinrück H.-P., Pesty F., Zhang L., and Madey T.E. Phys. Rev. B 51 (1995) 2427
20. Zhang L., Prsaud R., and Madey T.E. Phys. Rev. B 56 (1997) 10549
21. Grass M., Fischer D., Mathes M., Nielaba P., and Ganteför G. Appl. Phys. Lett. 81 (2002) 3810
22. Richter B., Kuhlenbeck H., Freund H.-J., and Bagus P.S. Phys. Rev. Lett. 93 (2004) 026805
23. Luo K., Lai X., Yi C.-W., Davis A., Gath K.K., and Goodman D.W. J. Phys. Chem. B 109 (2004) 4064
24. Boyen H.-G., Ethirajan A., Kästle G., Weigl F., Ziemann P., Schmid G., Garnier M.G., Büttner M., and Oelhafen P. Phys. Rev. Lett. 94 (2005) 016804
25. Sandell A., Libuda J., Brühwiler P.A., Andersson S., Maxwell A.J., Bäumer M., Martensson N., and Freund H.J. J. Vac. Sci. Technol. A 14 (1996) 1564
26. Lai X., St. Clair T.P., and Goodman D.W. Faraday Disc. 114 (1999) 279
27. Lim D.C., Lopez-Salido I., and Kim Y.D. Surf. Sci. 598 (2005) 96
28. Cai W., Zhong H., and Zhang L. J. Appl. Phys. 83 (1998) 1705
29. Bao X., Muhler M., Schedel-Niedrig Th., and Schlögl R. Phys. Rev. B 54 (1996) 2249
30. Waterhouse G.I.N., Bowmaker G.A., and Metson J.B. Surf. Interface Anal. 33 (2002) 401
31. Alvarez M.M., Khoury J.T., Schaaff T.G., Shafigullin M.N., Vezmar I., and Whetten R.L. J. Phys. Chem. B 101 (1997) 3706