Sharp bursts of high-flux reactive species in submicrosecond atmospheric pressure glow discharges

Applied Physics Letters

Volumn 89, Issue 23, 2006, Pages

  Walsh, J L ^a   Kong, M G ^a  

^a LOUGHBOROUGH UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; ELECTRIC VARIABLES MEASUREMENT; EMISSION SPECTROSCOPY; FREE RADICALS; NANOTECHNOLOGY;

OPTICAL EMISSION SPECTROSCOPY; REACTIVE PLASMA SPECIES; SHARP BURSTS; VOLTAGE PULSE;

GLOW DISCHARGES;

EID: 33845421305     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2397570     Document Type: Article

References (21)

1. J. R. Roth, Industrial Plasma Engineering (Institute of Physics, Philadelphia, 1995), Vol. 1, pp. 453-460.
2. S. Kanazawa, M. Kogoma, T. Moriwaki, and S. Okazaki, J. Phys. D 21, 838 (1988).
3. F. Massines and G. Gouda, J. Phys. D 31, 3411 (1998).
4. I. Radu, R. Bartnikas, and M. R. Wertheimer, IEEE Trans. Plasma Sci. 31, 411 (2003).
5. X. T. Deng and M. G. Kong, IEEE Trans. Plasma Sci. 32, 1709 (2004).
6. S. E. Babayan, J. Y. Jeong, V. J. Tu, J. Park, G. S. Selwyn, and R. F. Hicks, Plasma Sources Sci. Technol. 7, 286 (1998).
7. J. J. Shi, X. T. Deng, R. Hall, J. D. Punnet, and M. G. Kong, J. Appl. Phys. 94, 6303 (2003).
8. L. Baars-Hibbe, C. Schrader, P. Sichler, T. Cordes, K. H. Gericke, S. Buttgenbach, and S. Draeger, Vacuum 73, 327 (2004).
9. Z. Yu, K. Hoshimiya, J. D. Williams, S. F. Polvinen, and G. J. Collins, Appl. Phys. Lett. 83, 854 (2003).
10. J. J. Shi and M. G. Kong, Phys. Rev. Lett. 96, 105009 (2006).
11. M. G. Kong and X. T. Deng, IEEE Trans. Plasma Sci. 31, 7 (2003).
12. M. Laroussi, X. Liu, V. Kolobov, and R. Arslanbekov, J. Appl. Phys. 96, 3028 (2004).
13. M. Laroussi, X. Liu, V. Kolobov, and R. Arslanbekov, J. Appl. Phys. 96, 3028 (2004).
14. J. L. Walsh, J. J. Shi, and M. G. Kong, Appl. Phys. Lett. 88, 171501 (2006).
15. J. R. Roth, Phys. Plasmas 12, 057103 (2005).
16. M. Vleugels, G. Shama, X. Deng, E. Greenacre, T. Brocklehurst, and M. G. Kong, IEEE Trans. Plasma Sci. 33, 824 (2005).
17. J. L. Walsh, J. J. Shi, and M. G. Kong, Appl. Phys. Lett. 89, 161505 (2006).
18. M. Moravej, X. Yang, R. F. Hicks, J. Penelon, and S. E. Babayan, J. Appl. Phys. 99, 093395 (2006).
19. J. Shi and M. G. Kong, Appl. Phys. Lett. 86, 091502 (2005).
20. G. Nersisyan and W. G. Graham, Plasma Sources Sci. Technol. 13, 582 (2004).
21. J. J. Shi and M. G. Kong, J. Appl. Phys. 97, 023306 (2005).