Photolabile and thermally labile polymers as templates and for surface patterning

Polymers for Advanced Technologies

Volumn 17, Issue 9-10, 2006, Pages 691-693

  Voit, B ^a   Braun, F ^a   Gernert, M ^a   Sieczkowska, B ^a   Millaruelo, M ^a   Messerschmidt, M ^a   Mertig, M ^b   Opitz, J ^b  

^a LEIBNIZ INSTITUTE OF POLYMER RESEARCH DRESDEN   (Germany)

^b DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Films; Irradiation; Photolabile polymers; Radical polymerization; Thermally labile polymers

Indexed keywords

AMINES; BLOCK COPOLYMERS; DEPOSITION; FREE RADICAL POLYMERIZATION; LASER BEAM EFFECTS; MONOMERS; SYNTHESIS (CHEMICAL); TERPOLYMERS; ULTRAVIOLET RADIATION;

DIAZOSULFONATE; PHOTOLABILE POLYMERS; SURFACE PATTERNING; THERMALLY LABILE POLYMERS;

METALS;

AMINES; BLOCK COPOLYMERS; DEPOSITION; FREE RADICAL POLYMERIZATION; LASER BEAM EFFECTS; METALS; MONOMERS; SYNTHESIS (CHEMICAL); TERPOLYMERS; ULTRAVIOLET RADIATION;

BLOCK COPOLYMER; IRRADIATION; MONOMER; POLYAMINE; POLYMERIZATION; POLYMETHYL METHACRYLATE; SYNTHESIS; ULTRAVIOLET RADIATION;

EID: 33845360174     PISSN: 10427147     EISSN: 10991581     Source Type: Journal    
DOI: 10.1002/pat.793     Document Type: Article

References (6)

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