The reactions of water vapour on the surfaces of stoichiometric and reduced uranium dioxide: A high resolution XPS study

Catalysis Today

Volumn 120, Issue 2, 2007, Pages 151-157

  Senanayake, S D ^a,c   Waterhouse, G I N ^a   Chan, A S Y ^b   Madey, T E ^b   Mullins, D R ^c   Idriss, H ^a  

^a UNIVERSITY OF AUCKLAND   (New Zealand)

^b State University of New Jersey   (United States)

^c OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

Argon ions sputtering; D2O; O1s; Surface hydroxyls; Synchrotron radiation; TPXPS; U4f; UO2 x; UO2; Uranium oxides; XPS

Indexed keywords

MOLECULAR DYNAMICS; PROBABILITY; STOICHIOMETRY; THIN FILMS; URANIUM COMPOUNDS; VAPORS; X RAY PHOTOELECTRON SPECTROSCOPY;

ARGON-IONS SPUTTERING; SURFACE HYDROXYLS; URANIUM OXIDES;

REACTION KINETICS;

EID: 33845299826     PISSN: 09205861     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cattod.2006.07.040     Document Type: Article

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