Superconducting Nd1.85Ce0.15CuO4 films grown by the pulsed electron deposition technique

Physica C: Superconductivity and its Applications

Volumn 450, Issue 1-2, 2006, Pages 96-100

  Guo, Y F ^a,b   Chen, L M ^a,b   Lei, M ^a,b   Guo, X ^a,b   Li, P G ^a,b   Tang, W H ^a,b  

^a INSTITUTE OF PHYSICS   (China)

^b ZHEJIANG SCI TECH UNIVERSITY   (China)

Author keywords

Electron doped Nd1.85Ce0.15CuO4 film; Pulsed electron deposition technique

Indexed keywords

ANNEALING; DEPOSITION; EPITAXIAL GROWTH; NEODYMIUM COMPOUNDS; SUPERCONDUCTIVITY;

EPITAXIAL FILMS; PULSED ELECTRON DEPOSITION TECHNIQUE; VACUUM ANNEALING;

SUPERCONDUCTING FILMS;

EID: 33845288615     PISSN: 09214534     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physc.2006.08.017     Document Type: Article

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