Electromagnetic and thermal characterization of an UHF-applicator for concurrent irradiation and high resolution non-perturbing optical microscopy of cells

Bioelectromagnetics

Volumn 27, Issue 8, 2006, Pages 593-601

  Pickard, William F ^a   Moros, Edyardo G ^b,c   Cha, Bibianna A ^b   Novak, Petr ^b,c  

^a WASHINGTON UNIVERSITY IN ST LOUIS   (United States)

^b WASHINGTON UNIVERSITY SCHOOL OF MEDICINE   (United States)

^c UNIVERSITY OF ARKANSAS FOR MEDICAL SCIENCES   (United States)

Author keywords

Cultured cells; Electromagnetic; EMP level fields; Non perturbing; SAR; Thermal

Indexed keywords

APPLICATORS; CELLS; IRRADIATION; OPTICAL DATA STORAGE; OPTICAL MICROSCOPY;

CELL LAYERS; CULTURED CELL; ELECTROMAGNETIC CHARACTERIZATION; ELECTROMAGNETICS; EMP-LEVEL FIELD; HIGH RESOLUTION; NON-PERTURBING; THERMAL; THERMAL CHARACTERIZATION; ULTRA-HIGH-FREQUENCY;

CYTOLOGY;

AIR; ARTICLE; COOLING; ELECTROMAGNETIC FIELD; ILLUMINATION; IMAGING SYSTEM; IRRADIATION; MICROSCOPY; OPTICAL RESOLUTION; OPTICS; PRIORITY JOURNAL; PROCESS DESIGN; RADIATION APPLICATOR; STEADY STATE; TEMPERATURE; THERMAL ANALYSIS; ULTRA HIGH FREQUENCY IRRADIATION;

EID: 33845253174     PISSN: 01978462     EISSN: 1521186X     Source Type: Journal    
DOI: 10.1002/bem.20250     Document Type: Article

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