Ultrafast patterning of nanoparticles by electrostatic lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 6, 2006, Pages 3205-3208

  Joo, Jaebum ^a   Moon, Sangjun ^a   Jacobson, Joseph M ^a  

^a MIT MEDIA LAB   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; ELECTRON BEAM LITHOGRAPHY; ELECTROSTATICS; ETCHING; PHOTORESISTS; POLYMETHYL METHACRYLATES;

ELECTROSTATIC ATTRACTION; ELECTROSTATIC LITHOGRAPHY; ULTRAFAST PATTERNING;

NANOSTRUCTURED MATERIALS;

EID: 33845243137     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2363407     Document Type: Article

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