Erratum: Ferroelectric thin films: Review of materials, properties, and applications (Journal of Applied Physics (2006) 100 (051606))

Journal of Applied Physics

Volumn 100, Issue 10, 2006, Pages

  Setter, N ^a   Damjanovic, D ^a   Eng, L ^b   Fox, G ^c   Gevorgian, S ^d,e   Hong, S ^f   Kingon, A ^g   Kohlstedt, H ^h,k   Park, N Y ^f   Stephenson, G B ⁱ   Stolitchnov, I ^a   Taganstev, A K ^a   Taylor, D V ^a,j   Yamada, T ^a   Streiffer, S ⁱ  

^a EPFL   (Switzerland)

^b DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^c Ramtron International Corporation   (United States)

^d CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

^e Ericsson Microwave Systems AB   (Sweden)

^f Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^g North Carolina State University   (United States)

^h FORSCHUNGSZENTRUM JÜLICH   (Germany)

ⁱ ARGONNE NATIONAL LABORATORY   (United States)

^j Nanosys Inc   (United States)

^k University of California Berkeley   (United States)

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Author keywords

[No Author keywords available]

Indexed keywords

EID: 33845195896     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2393042     Document Type: Erratum

References (0)