An Intrinsically Photosensitive Polyimide

Chemistry of Materials

Volumn 1, Issue 1, 1989, Pages 163-166

  Moore, J A ^a   Dasheff, A N ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33845184686     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm00001a029     Document Type: Article

References (8)

1. Kubota, S.; Moriwaki, T.; Ando, T.; Fukami, A. J. Macromol. Sci., Chem. 1987, A24, 1407-1422. We note that the polyimide produced in this approach is not photosensitive; rather, the polyamic acid ester is subject to a photo-cross-linking reaction.
2. Crivello, J. V.; Lee, J. L.; Conlon, D. A. J. Polym. Sci., Polym. Chem. Ed. 1987, 25, 3293-3309.
3. Boule, P.; Lemaire, J. Tetrahedron Lett. 1976, 11, 865-868.
4. Noriaki, K.; Toyohiko, A.; Kanji, O.; Hideo, S. Eur. Pat. Appl. EP 1985.
5. Nakanishi, F.; Hasegawa, M.; Takahashi, H. Polym. J. 1973, 14, 440-444.
6. DeSchryver, F. C.; Boens, N.; Smets, G. Macromolecules 1974, 7, 399–406.
7. DeSchryver, F. C.; Boens, N.; Smets, G. J. Am. Chem. Soc. 1974, 96, 6463–6469.
8. Lamola, A. A. J. Am. Chem. Soc. 1966, 88, 813–819.