Installation of electric field electron beam blanker in high-resolution transmission electron microscopy

Review of Scientific Instruments

Volumn 77, Issue 11, 2006, Pages

  Hayashida, Misa ^a   Kimura, Yoshihide ^a   Taniguchi, Yoshifumi ^b   Otsuka, Masayuki ^b   Takai, Yoshizo ^a  

^a OSAKA UNIVERSITY   (Japan)

^b HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CAMERAS; DIFFRACTION; ELECTRIC FIELD EFFECTS; ELECTRIC FIELDS; HYSTERESIS; OPTICAL RESOLVING POWER;

DIFFRACTION PATTERN; ELECTRON BEAM BLANKER; ELECTRON DOSE;

ELECTRON BEAMS;

EID: 33751572657     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2387899     Document Type: Article

References (4)

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4. M. Hayashida, T. Nomaguchi, Y. Kimura, and Y. Takai, Micron (in press).