Influence of working pressure on the crystallinity and growth behavior of ZnO films deposited by reactive radio-frequency magnetron sputtering

Wuli Xuebao/Acta Physica Sinica

Volumn 55, Issue 10, 2006, Pages 5479-5486

  Liu, Zhi Wen ^a   Gu, Jian Feng ^a   Fu, Wei Jia ^a   Sun, Cheng Wei ^a   Li, Yong ^a   Zhang, Qing Yu ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Magnetron sputtering; Microstructure; Morphology; Optical property; ZnO film

Indexed keywords

EID: 33751572185     PISSN: 10003290     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (24)