Surface characteristics and corrosion behavior of Ti-Al-Zr alloy implanted with Al and Nb

Corrosion Science

Volumn 49, Issue 3, 2007, Pages 1069-1080

  Liu, Y Z ^a,b   Zu, X T ^a   Li, C ^b   Qiu, S Y ^b   Huang, X Q ^b   Wang, L M ^c  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b National Key Laboratory for Nuclear Fuel and Materials   (China)

^c UNIVERSITY OF MICHIGAN   (United States)

Author keywords

Al and Nb ion implantation; Corrosion; Phase formation; Ti Al Zr alloy

Indexed keywords

ALUMINUM; CORROSION; CORROSION RESISTANCE; ION IMPLANTATION; NIOBIUM; SURFACE PROPERTIES; X RAY PHOTOELECTRON SPECTROSCOPY;

CATHODIC KINETICS; PHASE FORMATION; TI-AL-ZR ALLOY;

TITANIUM ALLOYS;

ALUMINUM; CORROSION; CORROSION RESISTANCE; ION IMPLANTATION; NIOBIUM; SURFACE PROPERTIES; TITANIUM ALLOYS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33751536430     PISSN: 0010938X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.corsci.2006.06.028     Document Type: Article

References (32)

1. Liu X., Chu P.K., and Ding C. Mater. Sci. Eng. R 47 (2004) 49
2. Bonilla F.A., Skeldon P., Thompson T.G.E., Piekoszewski J., Chmielewski A.G., Sartowsk B., Stanislawski J., Bailey P., and Noakes T.C.Q. Surf. Coat. Technol. 200 (2006) 4674
3. Blanco-Pinzon C., Liu Z., Voisey K., Bonilla F.A., Skeldon P., Thompson G.E., Piekoszewski J., and Chmielewski A.G. Corros. Sci. 47 (2005) 1251
4. Bonilla F.A., Ong T.S., Skeldon P., Thompson G.E., Piekoszewski J., Chmielewski A., Sartowska B., and Stanislawski J. Corros. Sci 45 (2003) 403
5. Tomashov N.D., Chernova G.P., Ruscol Y.S., and Ayuyan G.A. Electrochim. Acta 19 (1974) 159
6. Kolman D.G., and Scully J.R. J. Electrochem. Soc 140 (1993) 2771
7. Schutz R.W., and Grauman J.S. In: Young C.S., and Durham J.C. (Eds). Industrial applications of titanium and zirconium vol. 917 (1986), ASTM STP p. 130
8. Tsyganov I., Wieser E., Matz W., Reuther H., and Richter E. Surf. Coat. Technol. 158-159 (2002) 318
9. Kolman D.G., and Scully J.R. J. Electrochem. Soc. 141 (1994) 2633
10. Krupa D., Baszkiewicz J., Jeziersk E., Mizera J., Wierzchon T., Barcz A., and Fillit R. Surf. Coat. Technol. 111 (1999) 86
11. Pham M.T., Zyganow I., Matz W., Reuther H., Oswald S., Richter E., and Wieser E. Thin Solid Films 310 (1997) 251
12. Ziegiler J.F., Biersack J.P., and Littmark U. The Stopping and Range of Ions in Solids 1 (1985), Pergamon, New York
13. Bertoti I., Mohai M., Sullivan J.L., and Saied S.O. Appl. Surf. Sci. 84 (1995) 357
14. Scrocco M. Chem. Phys. Lett. 61 (1979) 453
15. Wolf M., Schultze J.W., and Strehblow H.H. Surf. Interface Anal 17 (1991) 726
16. Lee P.A., Stork K.F., Maschhoff B.L., Nebesny K.W., and Armstrong N.R. Surf. Interface Anal. 17 (1991) 48
17. PDF-2 database, sets 1-44, ICCD, 1995.
18. Burrell M.C., and Armstrong N.R. J. Vac. Sci. Technol. A1 (1983) 1831
19. Okazaki Y., Rao S., Ito Y., and Tateishi T. Biomaterials 19 (1998) 1197
20. Sugizaki Y., Yasunaga T., and Tomari H. Surf. Coat. Technol. 83 (1996) 167
21. Krupa D., Baszkiewicz J., Kozubowski J.A., Barcz A., Sobczak J.W., Biliński A., Lewandowska-Szumie M., and Rajchel B. Biomaterials 23 (2002) 3329
22. Levy M., and Sklover G.N. J. Electrochem. Soc. 116 (1969) 323
23. Caprani A., and Frayret J.P. Electrochim. Acta 24 (1979) 835
24. Krupa D., Baszkiewicz J., Jezierska E., Mizera J., Wierzchon T., Barcz A., and Fillit R. Surf. Coat. Technol. 111 (1999) 86
25. Clayton C.R. Nucl. Instr. Meth. B 182-183 (1981) 865
26. Dearnaley G., and Good P.D. Nucl. Instr. Meth. B 189 (1981) 117
27. Ashworth V., Grant W.A., Procter R.P.M., and Wellington T.C. Corros. Sci. 16 (1976) 393
28. Tsyganov I., Wieser E., Matz U.W., Mücklich A., Reuther H., Pham M.T., and Richter E. Thin Solid Films 376 (2000) 188
29. Thair L., Kamachi Mudali U., Bhuvaneswaran N., Nair K.G.M., Asokamani R., and Raj B. Corros. Sci. 44 (2002) 2439
30. He J., Bai X., Ma C., and Chen H. Nucl. Instr. Meth. B 100 (1995) 59
31. De Damborenea J., Conde A., Palacio C., and Rodriguez R. Surf. Coat. Technol. 91 (1997) 1
32. Tsyganov I., Wieser E., Matz W., Mucklich A., and Reuther H. Nucl. Instr. Meth. B 161-163 (2000) 1069