Chemical Amplification Mechanisms for Microlithography

Chemistry of Materials

Volumn 3, Issue 3, 1991, Pages 394-407

  Reichmanis, E ^a   Houlihan, F ^a   Nalamasu, O ^a   Neenan, T X ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33751500109     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm00015a009     Document Type: Article

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