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Volumn 253, Issue 1-2, 2006, Pages 118-121

Modeling of hydrogen diffusion in silicon crystals

Author keywords

Defects; Diffusion; Hydrogen; Plasma processing; Silicon

Indexed keywords

COMPUTER SIMULATION; CRYSTALLOGRAPHY; DEFECTS; DIFFUSION; PLASMA SOURCES; SILICON;

EID: 33751351385     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.10.016     Document Type: Article
Times cited : (10)

References (11)
  • 4
    • 33751351318 scopus 로고
    • Pankove J.I., and Johnson N.M. (Eds), Academic Press, Inc.
    • Herring C., and Johnson N.M. In: Pankove J.I., and Johnson N.M. (Eds). Semiconductors and Semimetals Vol. 34 (1991), Academic Press, Inc. 332
    • (1991) Semiconductors and Semimetals , vol.34 , pp. 332
    • Herring, C.1    Johnson, N.M.2
  • 6
    • 33751343666 scopus 로고
    • Pankove J.I., and Johnson N.M. (Eds), Academic Press, Inc.
    • Johnson N.M. In: Pankove J.I., and Johnson N.M. (Eds). Semiconductors and Semimetals Vol. 34 (1991), Academic Press, Inc. 313
    • (1991) Semiconductors and Semimetals , vol.34 , pp. 313
    • Johnson, N.M.1
  • 9
    • 33751327782 scopus 로고    scopus 로고
    • Yi Zhang, Modeling hydrogen diffusion for solar cells passivation and process optimization, Ph.D. Thesis, New Jersey Institute of Technology and Rutgers, the State University of New Jersey-Newark, 2002.
  • 11
    • 33751313574 scopus 로고    scopus 로고
    • O.I. Velichko, Atomic diffusion processes under nonequilibrium state of the components of defect-impurity system of silicon crystals, Ph.D. Thesis, Institute of Electronics of the National Academy of Sciences of Belarus, 1988 (in Russian).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.