Heteroepitaxial growth of high K dielectric thin films by pulsed laser deposition

Integrated Ferroelectrics

Volumn 55, Issue , 2003, Pages 947-954

  Yu, W M ^a   Wong, K H ^a  

^a HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

Author keywords

Dielectric constant; Dielectric loss; Leakage current density; Pulsed laser deposition; Split target; X ray diffraction

Indexed keywords

CURRENT DENSITY; DIELECTRIC FILMS; DIELECTRIC LOSSES; EPITAXIAL GROWTH; LEAKAGE CURRENTS; PERMITTIVITY; PULSED LASER DEPOSITION; X RAY DIFFRACTION ANALYSIS;

CRYSTAL SUBSTRATES; LEAKAGE CURRENT DENSITY; SPLIT-TARGET;

THIN FILMS;

EID: 33751269888     PISSN: 10584587     EISSN: 16078489     Source Type: Conference Proceeding    
DOI: 10.1080/10584580390259416     Document Type: Article

References (17)

1. L. E. Cross, S. J. Jang, R. E. Newnham, and K. Uchino. Ferroelectrics 23, 187 (1980).
2. K. Katayama, M. Abe, T. Akiba, and H. Yanagida, J. Eur. Ceram. Soc. 5, 183 (1989).
3. M. C. Chae and N. K. Kim, Ferroelectrics 209, 603 (1998).
4. B. Noheda, D. E. Cox, and G. Shirane, Physical Review B 66, 054104 (2002).
5. Z.-G. Ye, B. Noheda, M. Dong, D. Cox, and G. Shirane, Physical Review B 64, 184114 (2001).
6. Z. Kighelman, D. Damjanovic, A. Seifert, L. Sagalowicz, and N. Setter, Appl. Phys Lett. 73, 2281 (1998).
7. M. C. Jiang, T. J. Hong, and T. B. Wu, Jpn. J. Appl. Phys, Part 1 33, 6301 (1994).
8. D. Lavric, R. A. Rao, Q. Gan, J. J. Krajewski, and C.-B. Eom, Integr. Ferroelectr. 21, 499 (1998).
9. J. -P. Maria, W. Hackenberger, and S. Trolier- McKinstry, J. Appl. Phys. 84, 5147 (1998).
10. Y. Takeshima, K. Shiratsuyu, H. Takagi, and K. Tomono, Jpn. J. Appl. Phys. Part 1, 34, 5083 (1995).
11. G. A. Smolenskii, J. Phys. Soc. Jpn. 28, 26 (1970).
12. Z. Kighelman, D. Damjanovic, A. Seifert, L. Sagalowicz, and N. Setter, Appl. Phys. Lett. 73, 2281 (1998).
13. C. Tantigate, J. Lee, and A. Safari, Appl. Phys. Lett. 66, 1611 (1995).
14. J. P. Maria, W. Hackenberger, and S. Trolier-McKinstry, J. Appl. Phys. 84, 5147 (1998).
15. S. K. Hau, K. H. Wong, P. W. Chan, and C. L. Choy, Appl. Phys. Lett. 66, 245 (1995).
16. W. B. Wu, K. H. Wong, and C. L. Choy, J. Phys. D: Appl. Phys. 32, L57 (1999).
17. L. F. francis and D. A. Payne, J. Am. Ceram. Soc. 74, 3000 (1991).