Thermal stability of cubic boron nitride films deposited by chemical vapor deposition

Journal of Physical Chemistry B

Volumn 110, Issue 42, 2006, Pages 21073-21076

  Yu, J ^a,b   Zheng, Z ^b   Ong, H C ^b   Wong, K Y ^b   Matsumoto, S ^c   Lau, W M ^b,d  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

^c NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^d UNIVERSITY OF WESTERN ONTARIO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

BORON COMPOUNDS; CATHODOLUMINESCENCE; CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; ELECTRONIC PROPERTIES; FILM GROWTH; GRAIN BOUNDARIES; SCANNING ELECTRON MICROSCOPY; THERMODYNAMIC STABILITY;

ANNEALING TEMPERATURE; BORON NITRIDE FILMS; STRUCTURAL DAMAGE;

THIN FILMS;

EID: 33751261456     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp0610766     Document Type: Article

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