Deposition of nanobead hexagonal crystals using silicon microcantilevers

Small

Volumn 2, Issue 12, 2006, Pages 1444-1447

  Valsesia, Andrea ^a   Leïchlé, Thierry ^b   Lacroix, Lise Marie ^a   Nicu, Liviu ^b   Bretagnol, Frederic ^a   Colpo, Pascal ^a   Rossi, François ^a   Bergaud, Christian ^c  

^a JOINT RESEARCH CENTRE   (Italy)

^b LAAS CNRS   (France)

^c UNIVERSITY OF TOKYO   (Japan)

Author keywords

Colloidal lithography; Microcantilevers; Microcontact printing; Nanocrystalline materials; Polystyrene

Indexed keywords

FLUOROCARBONS; LITHOGRAPHY; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; POLYSTYRENES; SCANNING ELECTRON MICROSCOPY; SILICON;

MERCAPTOHEXADECANOIC ACID (MHD); MICROCANTILEVERS; PACKED POLYSTYRENE (PS); POLYACRYLIC ACID (PAA);

CRYSTAL GROWTH;

NANOPARTICLE; SILICON;

ARTICLE; CHEMISTRY; CRYSTALLIZATION; SCANNING ELECTRON MICROSCOPY; ULTRASTRUCTURE; WETTABILITY;

CRYSTALLIZATION; MICROSCOPY, ELECTRON, SCANNING; NANOPARTICLES; SILICON; WETTABILITY;

EID: 33751247360     PISSN: 16136810     EISSN: 16136829     Source Type: Journal    
DOI: 10.1002/smll.200600248     Document Type: Article

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