Solvent and polymer concentration effects on the surface morphology evolution of immiscible polystyrene/poly(methyl methacrylate) blends

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 2038-2048

  Cui, Liang ^a   Ding, Yan ^a   Li, Xue ^a   Wang, Zhe ^a   Han, Yanchun ^a  

^a CHANGCHUN INSTITUTE OF APPLIED CHEMISTRY   (China)

Author keywords

Atomic force microscopy; Polymers; Surface morphology; X ray photoelectron spectroscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; CONCENTRATION (PROCESS); MORPHOLOGY; ORGANIC SOLVENTS; POLYMER BLENDS; POLYSTYRENES; SILICON WAFERS; SOLUBILITY; SPIN COATING; X RAY PHOTOELECTRON SPECTROSCOPY;

DICHLOROMETHANE; ETHYLBENZENES; TETRAHYDROFURAN;

POLYMETHYL METHACRYLATES;

EID: 33751235878     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.04.045     Document Type: Article

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