Annealing effects on the microstructure of amorphous carbon nitride films

Applied Surface Science

Volumn 253, Issue 4, 2006, Pages 2087-2092

  Wang, X C ^a   Li, Z Q ^a   Wu, P ^a   Jiang, E Y ^a   Bai, H L ^a  

^a Institute of Advanced Materials Physics   (China)

Author keywords

Carbon nitride films; High resolution transmission electron microscopy; Microstructure; Thermal stability; X ray photoelectron spectroscopy

Indexed keywords

ANNEALING; CARBON NITRIDE; CHEMICAL BONDS; HIGH RESOLUTION ELECTRON MICROSCOPY; MICROSTRUCTURE; SPUTTERING; THERMODYNAMIC STABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

ANNEALING TEMPERATURE; AROMATIC STRUCTURE; CARBON NITRIDE FILMS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;

AMORPHOUS FILMS;

EID: 33751206194     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.04.003     Document Type: Article

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