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Volumn 14, Issue 5, 2006, Pages 75-79

Application of cathode sputtering for obtaining ultra-thin metallic coatings on textile products

Author keywords

Cathode sputtering; Electromagnetic fields; Electromagnetic wave attenuation; Metallic coatings; Screening textiles

Indexed keywords

CATHODES; ELECTROMAGNETIC WAVES; METALS; SCANNING ELECTRON MICROSCOPY; SPUTTERING; TEXTILES; WEAVING;

EID: 33751160021     PISSN: 12303666     EISSN: 23007354     Source Type: Journal    
DOI: None     Document Type: Conference Paper
Times cited : (39)

References (8)
  • 1
    • 33751194550 scopus 로고    scopus 로고
    • Application of attenuation textile materials as a method to limit the exposition to electromagnetic fields
    • Dresden, Juni
    • Aniołczyk H., Koprowska J.-Application of attenuation textile materials as a method to limit the exposition to electromagnetic fields. 7th Dresdner Textiltagung 2004, Dresden, Juni, (2004),
    • (2004) 7th Dresdner Textiltagung 2004
    • Aniołczyk, H.1    Koprowska, J.2
  • 2
    • 33751198845 scopus 로고    scopus 로고
    • 'Problems of the technology of building rooms devoted for processing confidential information and their screening efficiency'
    • (in Polish) Łódź, Poland
    • Karpiński Cz., 'Problems of the technology of building rooms devoted for processing confidential information and their screening efficiency' (in Polish), Proceedings of the 3rd El-Tex 98 International Symposium, 1998, Łódź, Poland.
    • (1998) Proceedings of the 3rd El-Tex 98 International Symposium
    • Karpiński, Cz.1
  • 3
    • 84876871403 scopus 로고    scopus 로고
    • Information leaflets from Stech Co Ltd., Korea
    • Information leaflets from Stech Co Ltd., Korea.
  • 5
    • 0003814056 scopus 로고    scopus 로고
    • Adhezja i modyfikowanie warstwy wierzchniej tworzyw wielkoczasteczkowych
    • Warszawa, WNT
    • Zenkiewicz M., Adhezja i modyfikowanie warstwy wierzchniej tworzyw wielkoczasteczkowych, Warszawa, WNT 2000.
    • (2000)
    • Zenkiewicz, M.1
  • 6
    • 84957350583 scopus 로고
    • Sustained self-sputtering using direct current magnetron source
    • Posadowski W.P., Radzimski Z.J., Sustained self-sputtering using direct current magnetron source, J. Vac. Sci. Techn. vol. 6, 1993.
    • (1993) J. Vac. Sci. Techn , vol.6
    • Posadowski, W.P.1    Radzimski, Z.J.2
  • 8
    • 0013429453 scopus 로고    scopus 로고
    • Standard Test Method for Measuring the Electromagnetic Shielding Effectiveness of Planar Materials
    • ASTM D4935-99
    • ASTM D4935-99, Standard Test Method for Measuring the Electromagnetic Shielding Effectiveness of Planar Materials.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.