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Volumn 64, Issue , 2004, Pages 39-49

A new threshold voltage model and prediction of property of MFIS structure

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; DATA STORAGE EQUIPMENT; FERROELECTRIC THIN FILMS; MATHEMATICAL MODELS; SATURATION (MATERIALS COMPOSITION);

EID: 33751159421     PISSN: 10584587     EISSN: 16078489     Source Type: Conference Proceeding    
DOI: 10.1080/10584580490893556     Document Type: Article
Times cited : (2)

References (9)
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    • H. Ishiwara, "Current status and prospects of FET-type ferroelectric memories," FED Journal vol. 11 Supplement, 27-40, (2000).
    • (2000) FED Journal , vol.11 , Issue.SUPPL. , pp. 27-40
    • Ishiwara, H.1
  • 2
    • 33751178705 scopus 로고    scopus 로고
    • Special issue: Ferroelectric materials and their application 1998
    • Special issue: ferroelectric materials and their application 1998. Japan. J. Appl. Phys. 37, issue 9B.
    • Japan. J. Appl. Phys. , vol.37 , Issue.9 B
  • 3
    • 0001571869 scopus 로고
    • Physics of the ferroelectric non-volatile memory field effect transistor
    • S. L. Miller and P. J. McWhorter, "Physics of the ferroelectric non-volatile memory field effect transistor," J. Appl. Phys. 72(12), 5999-6010 (1992).
    • (1992) J. Appl. Phys. , vol.72 , Issue.12 , pp. 5999-6010
    • Miller, S.L.1    McWhorter, P.J.2
  • 4
    • 33744730024 scopus 로고    scopus 로고
    • Analyses of high frequency capacitance-voltage characteristics of metal-ferroelectrics-insulator-silicon structure
    • Taakeshi KANASHIMA and Masanori OKUYAMA, "Analyses of high frequency capacitance-voltage characteristics of metal-ferroelectrics-insulator-silicon structure," Jpn. J. Appl. Phys. 38, 2044-2048 (1999).
    • (1999) Jpn. J. Appl. Phys. , vol.38 , pp. 2044-2048
    • Kanashima, T.1    Okuyama, M.2
  • 5
    • 0036773570 scopus 로고    scopus 로고
    • Device modeling of ferroelectric memory field-effect transistor (FEMFET)
    • Hang-Ting Lue, Chien-Jang Wu, "Device modeling of ferroelectric memory field-effect transistor (FEMFET)," IEEE Transactions on Electron Device, 49, 10 (2002).
    • (2002) IEEE Transactions on Electron Device , vol.49 , pp. 10
    • Lue, H.-T.1    Wu, C.-J.2
  • 7
    • 33746114495 scopus 로고
    • Device modeling of ferroelectric capacitors
    • S. L. Miller and R. D. Nasby, "Device modeling of ferroelectric capacitors," J. Appl. Phys. 68(12), 6463-6471 (1990).
    • (1990) J. Appl. Phys. , vol.68 , Issue.12 , pp. 6463-6471
    • Miller, S.L.1    Nasby, R.D.2
  • 9
    • 0034248867 scopus 로고    scopus 로고
    • A BSIMS3v3 and DFIM based ferroelectric field effect transistor model
    • M. Ullmann, H. Goebel, H. Hoenigschmid, and T. Hander, "A BSIMS3v3 and DFIM based ferroelectric field effect transistor model," IEICE Trans. Electron 83(8), 1324-1330 (2000).
    • (2000) IEICE Trans. Electron , vol.83 , Issue.8 , pp. 1324-1330
    • Ullmann, M.1    Goebel, H.2    Hoenigschmid, H.3    Hander, T.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.