Structural stability of single-layered LaNi4.25Al0.75 film and its electrochemical hydrogen-storage properties

Rare Metals

Volumn 25, Issue 5, 2006, Pages 543-548

  Wang, Zhongmin ^a   Li, Chi Ying Vanessa ^b   Zhou, Huaiying ^a   Chan, Sammy Lap Ip ^b   Shi, Liu ^c  

^a GUILIN UNIVERSITY OF ELECTRONIC TECHNOLOGY   (China)

^b UNIVERSITY OF NEW SOUTH WALES   (Australia)

^c INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

Electrochemical properties; Hydrogen storage thin film; Magnetron sputtering; Structural stability

Indexed keywords

ALUMINUM; ELECTROCHEMISTRY; HYDROGEN; LANTHANUM; MAGNETRON SPUTTERING; MAGNETRONS; MICROSTRUCTURE; MONOLAYERS; NICKEL; STABILITY; SUBSTRATES; SURFACE STRUCTURE; X RAY DIFFRACTION;

DISCHARGE CAPACITY; ELECTROCHEMICAL PROPERTIES; HYDROGEN STORAGE THIN FILM; SIMULATED BATTERY TESTS; STRUCTURAL STABILITY;

THIN FILMS;

EID: 33751099581     PISSN: 10010521     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1001-0521(06)60096-X     Document Type: Article

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