Damascene and subtractive processing of narrow tungsten lines: Resistivity and size effect

Journal of Applied Physics

Volumn 100, Issue 9, 2006, Pages

  Traving, M ^a,b   Schindler, G ^a   Engelhardt, M ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b Reliability Methodology ^*  (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DAMASCENE; DEPOSITION TEMPERATURES; SUBTRACTIVE PROCESSING; SURFACE SCATTERING;

DEPOSITION; ELECTRIC CONDUCTIVITY; ETCHING; GRAIN SIZE AND SHAPE; MATHEMATICAL MODELS; TUNGSTEN;

ELECTRIC LINES;

EID: 33751099558     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2361092     Document Type: Article

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