Properties of TiN films on uranium surface by arc ion plating under different bias voltages

Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering

Volumn 35, Issue 9, 2006, Pages 1437-1440

  Liu, Tianwei ^a,b   Xian, Xiaobin ^a   Wu, Sheng ^a   Dong, Chuang ^b  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^b NATIONAL KEY LABORATORY FOR SURFACE PHYSICS AND CHEMISTRY   (China)

Author keywords

Arc ion plating; Bias voltage; TiN; Uranium

Indexed keywords

EID: 33751099051     PISSN: 1002185X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)