Light-induced anelastic change in a-Si(H)

Materials Science and Engineering: A

Volumn 442, Issue 1-2 SPEC. ISS., 2006, Pages 302-306

  Hinuma, T ^a   Kasai, H ^a   Tanimoto, H ^a   Yamanaka, M ^b   Sakata, I ^b   Mizubayashi, H ^a  

^a UNIVERSITY OF TSUKUBA   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

a Si(H): internal friction; Staebler Wronski effect; Thermal desorption

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS MATERIALS; DESORPTION; INTERNAL FRICTION; TEMPERATURE;

STAEBLER-WRONSKI EFFECT; THERMAL DESORPTION;

SILICON COMPOUNDS;

ACTIVATION ENERGY; AMORPHOUS MATERIALS; DESORPTION; INTERNAL FRICTION; SILICON COMPOUNDS; TEMPERATURE;

EID: 33751090487     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msea.2006.01.147     Document Type: Article

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