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Volumn 1, Issue , 2005, Pages 220-223

Forward Discrete Probability Propagation method for device performance characterization under process variations

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER AIDED DESIGN; ELECTRIC RESISTANCE; MONTE CARLO METHODS;

EID: 33751085762     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1145/1120725.1120809     Document Type: Conference Paper
Times cited : (5)

References (18)
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    • Dec.
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    • (1997) Int. Workshop on Statistical Metrology , pp. 8-11
    • Aoyama, K.1    Kunitomo, H.2    Tsuneno, K.3
  • 12
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    • Accurate statistical process variation analysis for 0.25-μm CMOS with Advanced TCAD Methodology
    • Nov.
    • H. Sato, H. Kunitomo, K. Tsuneno, K. Mori and H. Masuda, "Accurate Statistical Process Variation Analysis for 0.25-μm CMOS with Advanced TCAD Methodology," IEEE Transactions on Semiconductor Manufacturing, Vol.11, Iss.4, pp.575-582, Nov.1998
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    • A. Nardi, A. Neviani, E. Zanoni and C. Guardiani, "Impact of Unrealistic Worst Case Modeling on the Performance of VLSI Circuits in Deep Sub-micron CMOS Technologies" IEEE Transactions on Semiconductor Manufacturing, Vol.12, Iss.4, pp.396-402, Nov.1999
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.