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Metals and Materials International

Volumn 12, Issue 4, 2006, Pages 365-369

Electrochemical behavior of TiN film coated Ti-Nb alloys for dental materials

(3) Choe, Han Cheol a Ko, Yeong Mu a Park, Ha Ok b

a Chosun University (South Korea)

b Chonnam National University (South Korea)

Author keywords

Dental implant; Nb content; Osseointegration; Pitting corrosion resistance; TiN coating

Indexed keywords

BINARY ALLOYS; CORROSION RESISTANCE; CORROSION RESISTANT ALLOYS; CORROSION RESISTANT COATINGS; CURRENT DENSITY; DENTAL COMPOSITES; DENTAL MATERIALS; DENTAL PROSTHESES; METAL IMPLANTS; METALLIC FILMS; NIOBIUM ALLOYS; PITTING; SODIUM ALLOYS; SODIUM CHLORIDE; TEXTURES; TIN ALLOYS; TISSUE REGENERATION; TITANIUM ALLOYS; TITANIUM NITRIDE; VACUUM APPLICATIONS; VACUUM FURNACES; VOLTAGE REGULATORS;

CORROSION POTENTIALS; ELECTROCHEMICAL BEHAVIORS; MICRO-STRUCTURAL; NACL SOLUTION; OSSEOINTEGRATION; PITTING POTENTIAL; POTENTIOSTATS; TIN COATING;

DENTAL ALLOYS;

EID: 33751035646 PISSN: 15989623 EISSN: None Source Type: Journal
DOI: 10.1007/BF03027555 Document Type: Article

Times cited : (12)

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