Defect evolution during laser annealing

Materials Research Society Symposium Proceedings

Volumn 912, Issue , 2006, Pages 137-142

  Felch, Susan B ^a   Mayur, Abhilash ^a   Parihar, Vijay ^a   Nouri, Faran ^a   Jones, Kevin S ^b   Zeenberg, Daniel E ^b   Jones, Britta E ^b  

^a APPLIED MATERIALS INC   (United States)

^b University of Florida   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; ANNEALING; DOPING (ADDITIVES); LASER APPLICATIONS; TRANSMISSION ELECTRON MICROSCOPY;

LASER ANNEALING; RESIDUAL DEFECTS; SCAN RATE;

DEFECTS;

EID: 33751028840     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-0912-c04-03     Document Type: Conference Paper

References (9)

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3. D. Zeenberg and K. Jones, submitted to These Proceedings.
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8. A. Falepin, T. Janssens, S. Seven, W. Vandervorst, S.B. Felch, V. Parihar, and A. Mayur, Proc. of 2005 RTP Conference, IEEE.
9. J. M. Jacques, presentation at Spring 2004 Materials Research Society symposium.