Preparation of nano-sized CeO2 and its polishing performances

Guangxue Jishu/Optical Technique

Volumn 32, Issue 5, 2006, Pages

  Zhang, Peng Zhen ^a   Lei, Hong ^a   Zhang, Jian Ping ^a   Shi, Li Yi ^a  

^a SHANGHAI UNIVERSITY   (China)

Author keywords

Chemical mechanical polishing (CMP); Glass substrate; Nano sized CeC2

Indexed keywords

EID: 33750899335     PISSN: 10021582     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (21)