Local stress assessment in patterned interlayer dielectric films using cathodoluminescence spectroscopy

Microscopy and Microanalysis

Volumn 12, Issue SUPPL. 2, 2006, Pages 1508-1509

  Kakinuma, S ^a   Kodera, M ^b   Nishikata, K ^a   Aoyama, J ^a   Saijo, Y ^a   Pezzotti, G ^c  

^a HORIBA LTD   (Japan)

^b TOSHIBA CORPORATION   (Japan)

^c KYOTO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33750858160     PISSN: 14319276     EISSN: 14358115     Source Type: Journal    
DOI: 10.1017/S1431927606061976     Document Type: Conference Paper

References (5)

1. G. Pezzotti, World Patent No. PCT/JP03/03037, (2003)
2. A. Tezaki, et al, Proc. 1990 IRPS, (1990) 221
3. M. Kodera, et al, Proc. Int'l Interconnect Tech. Conf., San Francisco, (2005) 212
4. Y. Yamashita, et al., J. Appl. Phys. 98, (2005) 034110
5. This work was supported by the New Energy and Industrial Development Organization (NEDO). Ebara Co. is acknowledged for providing samples.