Preparation and characterisation of amorphous Cu:7,7,8,8-Tetracyanoquinodimethane thin films with low surface roughness via thermal co-deposition

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 1893-1896

  Kever, Thorsten ^a   Nauenheim, Christian ^a   Böttger, Ulrich ^a   Waser, Rainer ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

Amorphous materials; Physical vapor deposition; Resistive switching; Scanning electron microscopy

Indexed keywords

AMORPHOUS FILMS; CHARACTERIZATION; CHARGE TRANSFER; PHYSICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS;

COEVAPORATION; RESISTIVE SWITCHING; SWITCHING CYCLES; SWITCHING VOLTAGES;

THIN FILMS;

EID: 33750826529     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.07.028     Document Type: Article

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