Thermal stability of nanometer range Ti/Ni multilayers

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 2213-2219

  Gupta, Rachana ^a,b   Gupta, Mukul ^a   Kulkarni, S K ^c   Kharrazi, S ^c   Gupta, A ^a   Chaudhari, S M ^a  

^a UGC DAE CONSORTIUM FOR SCIENTIFIC RESEARCH   (India)

^b ETH ZURICH   (Switzerland)

^c UNIVERSITY OF PUNE   (India)

Author keywords

Amorphization; Annealing; Diffusion; Interfaces; Magnetic properties and measurements; Multilayers; Nanostructures; X ray reflectivity

Indexed keywords

AMORPHOUS MATERIALS; MICROSTRUCTURE; THERMODYNAMIC PROPERTIES; X RAY DIFFRACTION ANALYSIS;

BILAYER PERIODICITY; POLY-CRYSTALLINE LAYERS; X-RAY REFLECTIVITY;

MULTILAYERS;

EID: 33750820197     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.04.047     Document Type: Article

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