Highly adhesive layered molybdenum oxide thin films prepared on a silicon substrate using suitable buffer materials

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 2709-2716

  Itoh, Toshio ^a   Matsubara, Ichiro ^a   Shin, Woosuck ^a   Izu, Noriya ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Buffer layer; Intercalation; Layered organic inorganic hybrid; Molybdenum trioxide

Indexed keywords

ADHESION; CHEMICAL SENSORS; CHEMICAL VAPOR DEPOSITION; INTERCALATION COMPOUNDS; MOLYBDENUM COMPOUNDS;

BUFFER LAYER; INTERLAYERS; LAYERED ORGANIC INORGANIC HYBRIDS; MOLYBDENUM TRIOXIDE;

THIN FILMS;

EID: 33750812561     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.08.005     Document Type: Article

References (27)

1. Ogawa M., and Kuroda K. Chem. Rev. 95 (1995) 399
2. Ogawa M., and Kuroda K. Bull. Chem. Soc. Jpn. 70 (1997) 2593
3. Sasaki T., and Watanabe M. J. Am. Chem. Soc. 120 (1998) 4682
4. Costantino U., Coletti N., Nocchetti M., Aloisi G.G., and Elisei F. Langmuir 15 (1999) 4454
5. LeBaron P.C., and Pinnavaia T.J. Chem. Mater. 13 (2001) 3760
6. Roto R., Yamagishi A., and Villemure G. J. Electroanal. Chem. 572 (2004) 101
7. Sato H., Hiroe Y., Tamura K., and Yamagishi A. J. Phys. Chem., B 109 (2005) 18935
8. Itoh T., Shichi T., Yui T., Takahashi H., Inui Y., and Takagi K. J. Phys. Chem., B 109 (2005) 3199
9. Shichi T., and Takagi K. J. Photochem. Photobiol., C Photochem. Rev. 1 (2000) 113
10. Takata T., Shinohara K., Tanaka A., Hara M., Kondo J.N., and Domen K. J. Photochem. Photobiol., A Chem. 106 (1997) 45
11. Mitzi D.B. Chem. Mater. 13 (2001) 3283
12. Usuki A., Kojima Y., Kawasumi M., Okada A., Fukushima Y., Kurauchi T., and Kamigaito O. J. Mater. Res. 8 (1993) 1179
13. Matsubara I., Hosono K., Murayama N., Shin W., and Izu N. Bull. Chem. Soc. Jpn. 77 (2004) 1231
14. Hosono K., Matsubara I., Murayama N., Shin W., and Izu N. Chem. Mater. 17 (2005) 349
15. Nazar L.F., Zhang Z., and Zinkweg D. J. Am. Chem. Soc. 114 (1992) 6239
16. Goward G.R., Kerr T.A., Power W.P., and Nazar L.F. Adv. Mater. 10 (1998) 449
17. Sukpirom N., Oriakhi C.O., and Lerner M.M. Mater. Res. Bull. 35 (2000) 325
18. Hagrman P.J., LaDuca Jr. R.L., Koo H.-J., Rarig Jr. R.R., Haushalter R.C., Whangbo M.-H., and Zubieta J. Inorg. Chem. 39 (2000) 4311
19. Shao K., Ma Y., Cao Y., Chen Z., Ji X., and Yao J. Chem. Mater. 13 (2001) 250
20. Silva Filho I.P., Santos J.C.O., Conceição M.M., Nunes L.M., Santos I.M.G., and Souza A.G. Mater. Lett. 59 (2005) 2510
21. de Farias R.F. Mater. Chem. Phys. 90 (2005) 302
22. Ivanova T., Szekeres A., Gartner M., Gogova D., and Gesheva K.A. Electrochim. Acta 46 (2001) 2215
23. Ivanova T., Surtchev M., and Gesheva K. Mater. Lett. 53 (2002) 250
24. Thomas D.M., and McCarron III E.M. Mater. Res. Bull. 21 (1986) 945
25. Nazar L.F., Zhang Z., and Zinkweg D. J. Am. Chem. Soc. 114 (1992) 6239
26. Sukpirom N., Oriakhi C.O., and Lerner M.M. Mater. Res. Bull. 35 (2000) 325
27. Wei X.M., and Zeng H.C. J. Phys. Chem., B 107 (2003) 2619